It can be assumed that sometimes, secondary thermal ALD reactions via the gaseous by-products and solutions may lead to an seemingly improved conformality than may be achieved by using a “pure” plasma approach. As an illustration, experimental film thickness profiles received for PE-ALD of Al2O3 by Dendooven et al. We https://ald-surface-engineering60360.sharebyblog.com/20069333/getting-my-atomic-layer-deposition-to-work